DATE | HS_CODE | Product Description | Trademark | Country | Net Weight | Statistical Cost | Place | Shipper Name | Consignee Name |
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2017-09-05 | 8486209003 | To remove the photoresist AND TREATMENT OF SEMICONDUCTOR PLATES: INSTALLATION plasma clearance ATTO, at a specified EQUIPMENT is designed for plasma-chemical processing of semiconductor wafers and substrates up to 200 mm in diameter for issl | *** | GERMANY | 58 | 10124,18 | *** | ***** | ***** |
2017-09-05 | 8543709000 | EQUIPMENT having individual functions, for use in manufacture of optical fiber BATH ULTRASONIC TECHNIQUE H RK 102 is a device for cleaning (washing) of semiconductor wafers, CRYSTALS, OP | *** | GERMANY | 17 | 4369,44 | *** | ***** | ***** |
2017-09-21 | 8486209009 | INSTALLATION plasma treatment of surfaces of semiconductor wafers are used in the semiconductor industry Manufacturing Cycle microelectronic components, not for military purposes, NOT FOR MEDICINE, AND DOES NOT CONSTITUTE RES VCHU.POSTAVLYAETSYA PER HOUR: | *** | GERMANY | 106 | 30150,49 | *** | ***** | ***** |
2017-09-27 | 2905120000 | PROPANE-2-OL (ISOPROPYL ALCOHOL) isopropanol, isopropanol IPA semiconductor purity SSULSI, in a barrel filled to 190 liters and 380 liters ALL APPLICABLE FOR DRYING AFTER silicon wafers to solvent chemical treatments, to produce IF | *** | GERMANY | 296.4 | 2295,84 | *** | ***** | ***** |
2017-10-03 | 9030820000 | Instruments and apparatus for measuring or checking semiconductor wafers or the device:. POSTAV.V RAZOBRAN.VIDE PARTLY FOR TRANSPORTATION FACILITIES, HAS RADIOELKTR.I VYSOKOCHAST.SRE-in, not the military. PURPOSE. EPS150TRIAX triaxial probe station PRETSIZ | *** | GERMANY | 112 | 33390,05 | *** | ***** | ***** |
2017-10-04 | 8486209003 | SYSTEM wet chemistry ULTRA-CLEAN wafer. Used in the manufacture of semiconductor devices and integrated circuits in the technological process of clearing of semiconductor wafers. DOES NOT CONTAIN SOURCES IONIZIRUYUSCHEG | ATP | GERMANY | 120 | 127732,92 | PUTTEN | ***** | ***** |
2017-10-04 | 8486209003 | SYSTEM wet chemistry ULTRA-CLEAN wafer. Used in the manufacture of semiconductor devices and integrated circuits in the technological process of clearing of semiconductor wafers. DOES NOT CONTAIN SOURCES IONIZIRUYUSCHEG | ATP | GERMANY | 120 | 127732,92 | PUTTEN | ***** | ***** |
2017-10-20 | 9030820000 | Instruments and apparatus for measuring or checking semiconductor wafers or devices not MILITARY BS TESTING STATION / STATION testing, including: - JT 5112 64-channel EXPANDER I / O (1 PCS); - JTVB / N IMAGING MODULE (1 PCS). | *** | GERMANY | 4 | 21928,47 | *** | ***** | ***** |
2017-10-22 | 8421398007 | Equipment for filtering or purifying gases used in the production of semiconductor wafers, not for military purposes. | "CS CLEAN SOLUTIONS AG" | GERMANY | 129 | 16311,49 | ISMANING | ***** | ***** |
2017-10-22 | 8421398007 | Equipment for filtering or purifying gases used in the production of semiconductor wafers, not for military purposes. | "CS CLEAN SOLUTIONS AG" | GERMANY | 129 | 16311,49 | ISMANING | ***** | ***** |