DATE | HS_CODE | Product Description | Trademark | Country | Net Weight | Statistical Cost | Place | Shipper Name | Consignee Name |
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2017-09-15 | 8486909008 | Let cool for a base in the form of complex TECHNOLOGY PRODUCTS as a plate made of aluminum with holes for fastening & P holes for the installation of a silicon wafer, YAVL.CHASTYU INSTALLATION TRYMAX NEO2000: PROVIDE NOT FOR SALE FOR THIS INSTALLATION | *** | NETHERLANDS | 6.1 | 1111,25 | *** | ***** | ***** |
2017-09-19 | 8486909008 | OF EQUIPMENT FOR ICP-ol E-VA semiconductor device from the pallet GROSS WEIGHT - KG 23.000 PEM-3.07.45.412 / 3 STAINLESS STEEL SHAFT WITH GEAR WHEEL / PEM-3.07.45.412 / 3 the upper rollers, 75X2,5 CM MATERIAL - stainless steel + rubber yavl. W / AUTO PART | *** | KOREA REPUBLIC OF | 21 | 5972,36 | *** | ***** | ***** |
2017-09-21 | 8486209009 | INSTALLATION plasma treatment of surfaces of semiconductor wafers are used in the semiconductor industry Manufacturing Cycle microelectronic components, not for military purposes, NOT FOR MEDICINE, AND DOES NOT CONSTITUTE RES VCHU.POSTAVLYAETSYA PER HOUR: | *** | GERMANY | 106 | 30150,49 | *** | ***** | ***** |
2017-09-28 | 8486209009 | Machines and apparatus for dry etching pattern onto a semiconductor material. NOT Pec art without yavl sources of ionizing radiation, NOT COLOR ferrous and metal, contact with food FOOD AND WATER PIEVOY, CET APPOINTED NOT SUBJECT OWN INTELLIGENCE. SETTING | *** | UNITED KINGDOM | 1013 | 423036,09 | *** | ***** | ***** |
2017-09-28 | 8486902000 | Reflectors for directing a beam of coherent radiation monochrome single-minded focus, is made on a glass substrate is used for beam shaping SVETA.PREDSTAVLYAET from itself creeping ELEMENT with mirrored SPUTTER COMPLEX: PROCESS | *** | UNITED STATES | 0.4 | 2647,5 | *** | ***** | ***** |
2017-10-03 | 8486902000 | CAPACITY FOR SOLUTION deionized water .YAVLYAETSYA ONLY PART OF THE INSTALLATION depositing a dielectric LAYERS FOR MAINTAINING TECHNICAL PARAMETERS deionized water in the system APPLICATION photographic emulsion on the substrate | APPLIED | UNITED STATES | 33 | 34075,14 | MOSCOW | ***** | ***** |
2017-10-03 | 8486902000 | CAPACITY FOR SOLUTION deionized water .YAVLYAETSYA ONLY PART OF THE INSTALLATION depositing a dielectric LAYERS FOR MAINTAINING TECHNICAL PARAMETERS deionized water in the system APPLICATION photographic emulsion on the substrate | APPLIED | UNITED STATES | 33 | 34075,14 | MOSCOW | ***** | ***** |