DATE | HS_CODE | Product Description | Trademark | Country | Net Weight | Statistical Cost | Place | Shipper Name | Consignee Name |
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2017-09-20 | 8486209009 | INSTALLATION plasma etching inductively coupled plasma ART: CORIAL 210IL INTENDED: for etching different layers on semiconductor wafers. Plasma etching - a technology and dry etching is used to remove a portion of F | *** | FRANCE | 940 | 450783,52 | *** | ***** | ***** |
2017-10-03 | 8486902000 | CAPACITY FOR SOLUTION deionized water .YAVLYAETSYA ONLY PART OF THE INSTALLATION depositing a dielectric LAYERS FOR MAINTAINING TECHNICAL PARAMETERS deionized water in the system APPLICATION photographic emulsion on the substrate | APPLIED | UNITED STATES | 33 | 34075,14 | MOSCOW | ***** | ***** |
2017-10-03 | 8486902000 | CAPACITY FOR SOLUTION deionized water .YAVLYAETSYA ONLY PART OF THE INSTALLATION depositing a dielectric LAYERS FOR MAINTAINING TECHNICAL PARAMETERS deionized water in the system APPLICATION photographic emulsion on the substrate | APPLIED | UNITED STATES | 33 | 34075,14 | MOSCOW | ***** | ***** |
2017-10-04 | 8486909008 | PARTS EXCLUSIVELY intended for installation JUSUNG GENAON PLUS ETCHING hard mask and the magnetic layers with plasma silicon wafers IN SEMICONDUCTOR MANUFACTURING: | JUSUNG | *** | 150 | 50319,93 | Gyeonggi | ***** | ***** |
2017-10-04 | 8486909008 | PARTS EXCLUSIVELY intended for installation JUSUNG GENAON PLUS ETCHING hard mask and the magnetic layers with plasma silicon wafers IN SEMICONDUCTOR MANUFACTURING: | JUSUNG | *** | 150 | 50319,93 | Gyeonggi | ***** | ***** |
2017-10-05 | 8486909008 | PARTS EXCLUSIVELY intended for installation JUSUNG GENAON PLUS ETCHING hard mask and the magnetic layers with plasma silicon wafers IN SEMICONDUCTOR MANUFACTURING: | JUSUNG | KOREA REPUBLIC OF | 0.2 | 3312,78 | Gyeonggi | ***** | ***** |
2017-10-05 | 8486909008 | PARTS EXCLUSIVELY intended for installation JUSUNG GENAON PLUS ETCHING hard mask and the magnetic layers with plasma silicon wafers IN SEMICONDUCTOR MANUFACTURING: | JUSUNG | KOREA REPUBLIC OF | 0.2 | 3312,78 | Gyeonggi | ***** | ***** |
2017-10-24 | 8486909008 | SECTION LINE APPLICATION on a silicon wafer LAYERS transparent conductive oxide and a metal magnetron sputter HELIA PVD, AVAILABLE FOR FREE on their own production companies, recipients designed specifically | MEYER BURGER | GERMANY | 805 | 35265,01 | Novocheboksarsk | ***** | ***** |
2017-10-24 | 8486909008 | SECTION LINE APPLICATION on a silicon wafer LAYERS transparent conductive oxide and a metal magnetron sputter HELIA PVD, AVAILABLE FOR FREE on their own production companies, recipients designed specifically | MEYER BURGER | GERMANY | 805 | 35265,01 | Novocheboksarsk | ***** | ***** |