DATE | HS_CODE | Product Description | Trademark | Country | Net Weight | Statistical Cost | Place | Shipper Name | Consignee Name |
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2017-09-05 | 8486209003 | To remove the photoresist AND TREATMENT OF SEMICONDUCTOR PLATES: INSTALLATION plasma clearance ATTO, at a specified EQUIPMENT is designed for plasma-chemical processing of semiconductor wafers and substrates up to 200 mm in diameter for issl | *** | GERMANY | 58 | 10124,18 | *** | ***** | ***** |
2017-10-04 | 8486209003 | SYSTEM wet chemistry ULTRA-CLEAN wafer. Used in the manufacture of semiconductor devices and integrated circuits in the technological process of clearing of semiconductor wafers. DOES NOT CONTAIN SOURCES IONIZIRUYUSCHEG | ATP | GERMANY | 120 | 127732,92 | PUTTEN | ***** | ***** |
2017-10-04 | 8486209003 | SYSTEM wet chemistry ULTRA-CLEAN wafer. Used in the manufacture of semiconductor devices and integrated circuits in the technological process of clearing of semiconductor wafers. DOES NOT CONTAIN SOURCES IONIZIRUYUSCHEG | ATP | GERMANY | 120 | 127732,92 | PUTTEN | ***** | ***** |
2017-10-23 | 8486209003 | To remove the photoresist or cleaning semiconductor wafers: for rinsing and drying a semiconductor wafer. NO MILITARY, NOT DOMESTIC USE, DO NOT SCRAP EL.OBORUDOVANIYA | RAMGRABER GMBH | GERMANY | 110 | 29006,19 | Brunnthal HOFOLDING GERMANY | ***** | ***** |
2017-10-23 | 8486209003 | To remove the photoresist or cleaning semiconductor wafers: for rinsing and drying a semiconductor wafer. NO MILITARY, NOT DOMESTIC USE, DO NOT SCRAP EL.OBORUDOVANIYA | RAMGRABER GMBH | GERMANY | 110 | 29006,19 | Brunnthal HOFOLDING GERMANY | ***** | ***** |
2017-10-24 | 8486209003 | Setting processing in organic solvents are used for cleaning the semiconductor wafer before the process of spraying of metals, unassembled. YEAR - 2017, packed in a wooden box | TETREON TECHNOLOGIES | UNITED KINGDOM | 1480 | 619500 | MOSCOW | ***** | ***** |
2017-10-24 | 8486209003 | Setting processing in organic solvents are used for cleaning the semiconductor wafer before the process of spraying of metals, unassembled. YEAR - 2017, packed in a wooden box | TETREON TECHNOLOGIES | UNITED KINGDOM | 1480 | 619500 | MOSCOW | ***** | ***** |
2017-10-26 | 8486209003 | INSTALLATION plasma cleaning, model, is designed to clean POVERHNOCTEY wafer photoresist FROM ORGANIC contamination prior technological operations splicing CONCLUSIONS circuits, installation of crystals are used in | PINK | GERMANY | 221 | 38488,51 | Wertheim | ***** | ***** |
2017-10-26 | 8486209003 | INSTALLATION plasma cleaning, model, is designed to clean POVERHNOCTEY wafer photoresist FROM ORGANIC contamination prior technological operations splicing CONCLUSIONS circuits, installation of crystals are used in | PINK | GERMANY | 221 | 38488,51 | Wertheim | ***** | ***** |